| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c16d2144a81bfa32a665dca1e93c3d37 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-032
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-327
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-0266 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3211
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32449
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32119
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6833
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32724
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32541
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-68735 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-683 |
| filingDate |
2018-06-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_66f767a8836ebac514332662a7d144eb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_733c888498a2947c9cbe54130f176c16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cd4c1dc5549c4b0627dcca609761be28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f3a3de0ae38b782b4b7821768e915f5d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dbf1bf638a35b2793ddcf6adac91e37a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7b3059e31ef162e27e07ae205cebd9fc |
| publicationDate |
2019-05-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2019148119-A1 |
| titleOfInvention |
Plasma processing apparatus |
| abstract |
Provided is a plasma processing apparatus for controlling a distribution of plasma at an edge region of a chamber during a plasma process, thereby reliably performing the plasma process on a semiconductor substrate. The plasma processing apparatus includes a chamber including an outer wall defining a reaction space and a window covering an upper portion of the outer wall; a coil antenna positioned above the window and including at least two coils; and an electrostatic chuck (ESC) positioned in a lower portion of the chamber, wherein an electrode is located inside the ESC, wherein the electrode includes a first electrode for chucking and at least one second electrode, the at least one second electrode provided at an edge of the inside of the ESC so as to have a tilt with respect to the top surface of the ESC. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11037765-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2022351946-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11545344-B2 |
| priorityDate |
2017-11-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |