Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y40-00 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2012 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0271 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-033 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L53-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L53-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L25-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y30-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y40-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D153-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F297-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L53-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L25-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F297-02 |
filingDate |
2019-01-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_396d61f1c5f8fbc8129fce9dafb1350e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9f8e6cce869d00b71c3f5f764380c51a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bda610e3d51ab514daf7538f668089e2 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dcb2c4837169cb5346fc2ab4884a4187 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_58d6389373ea91c0aa699e518852d93f |
publicationDate |
2019-05-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-2019135967-A1 |
titleOfInvention |
Composition for pattern formation, and pattern-forming method |
abstract |
A composition for pattern formation includes a first polymer, a second polymer and a solvent. The first polymer includes: a first block including a first structural unit derived from a substituted or unsubstituted styrene; and a second block including a second structural unit other than the first structural unit. The second polymer includes: the first structural unit; and a group bonding to at least one end of a main chain thereof and including a polar group. The polar group is preferably a hydroxy group or a carboxyl group. A number average molecular weight of the second polymer is preferably no greater than 6,000. A mass ratio of the second polymer to the first polymer is preferably no less than 0.15 and no greater than 0.4. The solvent preferably comprises a compound comprising a hydroxyl group and an alkyl ester group. |
priorityDate |
2016-07-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |