| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32134
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31105
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30604
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67057
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67173
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67017
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31111
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67075
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67086 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306 |
| filingDate |
2018-10-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_777a25c422fee15c0462a01b04af9ac7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9a7fb24777894397fe17ea413f9d0798
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1119bd950232eb349d706619954ab897
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8d1f89f7fe0aba111945085d252f5e43
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6abb6deafdfd3cf8ba2798cf6bccc7ec
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_092d3251084c18599b1148afcd0fe716
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_43a38db146f922608a897049af9079cc
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_15c8e3050c04cfbddfa60e6181d8eed7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_df61cbe12852608f134ca01fd8bfc95f |
| publicationDate |
2019-04-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2019122906-A1 |
| titleOfInvention |
Substrate processing apparatus, substrate processing method and recording medium |
| abstract |
A substrate processing apparatus, a substrate processing method and a recording medium capable of shortening an etching processing time are provided. The substrate processing apparatus includes a substrate processing tub, a mixing unit and a supply line. The substrate processing tub is configured to perform an etching processing therein with an etching liquid. The mixing unit is configured to mix a new liquid with a silicon-containing compound or a liquid containing the silicon-containing compound. The supply line is configured to supply a mixed solution mixed by the mixing unit into the substrate processing tub. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11142694-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11781066-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11424141-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11373886-B2 |
| priorityDate |
2017-10-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |