| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_13a8e41e9ad15bede11baa179e73fe85 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C64-106
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C64-141
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-029
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-033
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0385
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0037
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-0016
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B33Y70-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L63-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L67-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G59-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L25-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L25-12 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C64-106
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C64-141
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L25-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L67-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-029 |
| filingDate |
2017-02-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e525c27a8bd76d6420b90620a323578a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3b803d1176091a69df27c320811118de |
| publicationDate |
2019-02-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2019049841-A1 |
| titleOfInvention |
Composition For Optical Stereolithography |
| abstract |
Provided is a composition for optical stereolithography, which is photo-curable within a shorter time, and is excellent in mechanical properties after photo-curing. Specifically, provided is a composition for optical stereolithography containing (A) a cationic polymerizable epoxy resin that is a novolac epoxy resin and/or an epoxy resin having a predetermined structure; (B) a cationic polymerizable compound being other than the component (A) and having a glycidyl ether structure; (C) a radical polymerizable compound having a methacrylic group and/or an acrylic group; (D) a styrene-containing copolymer resin that is a copolymer resin of styrene and predetermined maleic anhydride and/or a copolymer resin of styrene and methacrylic acid or acrylic acid; (E) a cationic polymerization initiator that is a sulfonium compound or a bis(alkylphenyl)iodonium compound; (F) a radical polymerization initiator; and (G) a sensitizer. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113174016-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2021276257-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113527838-A |
| priorityDate |
2016-02-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |