http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2019013235-A1

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_af4cc10d515454e59278de7445531247
classificationCPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02532
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02529
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02238
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0262
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76251
classificationIPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-762
filingDate 2018-08-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_567e7c18d7aaa07d241ae77051bfbb07
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_eb9aa27cc501813c7d3701b605b35afb
publicationDate 2019-01-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2019013235-A1
titleOfInvention Method of manufacturing high resistivity soi wafers with charge trapping layers based on terminated si deposition
abstract A method of preparing a single crystal semiconductor handle wafer in the manufacture of a silicon-on-insulator device is provided. The method comprises forming a multilayer of passivated semiconductors layers on a dielectric layer of a high resistivity single crystal semiconductor handle wafer. The method additionally comprises forming a semiconductor oxide layer on the multilayer of passivated semiconductor layers. The multilayer of passivated semiconductor layers comprise materials suitable for use as charge trapping layers between a high resistivity substrate and a buried oxide layer in a semiconductor on insulator structure.
priorityDate 2013-10-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10083855-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8853054-B2
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID61330
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID426099075
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24261
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419543920
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419526622
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6336883
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID450964499
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419520488
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457707758
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID26042
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419557764
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457707770
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID292779
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID57473004
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419593465
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419518429
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID3084099
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID22477099
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419522015
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID150906
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID74123
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6327668
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID70434
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419544406
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID426099666
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID139070
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559541
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6327272
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID61685
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID31170
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID62392
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419520721
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5461123
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID426098993
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419544975
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID62395
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457707785
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID423029084

Total number of triples: 57.