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filingDate 2017-09-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2018-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2018374963-A1
titleOfInvention Transcap device architecture with reduced control voltage and improved quality factor
abstract Certain aspects of the present disclosure provide a semiconductor capacitor. The semiconductor capacitor generally includes an insulative layer, and a semiconductor region disposed adjacent to a first side of the insulative layer. The semiconductor capacitor also includes a first non-insulative region disposed adjacent to a second side of the insulative layer. In certain aspects, the semiconductor region may include a second non-insulative region, wherein the semiconductor region includes at least two regions having at least one of different doping concentrations or different doping types, and wherein one or more junctions between the at least two regions are disposed above or below the first non-insulative region.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10424641-B1
priorityDate 2017-06-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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