| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_37f4922dfb7777b019e504b885211b8e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_da66f6b0c2aea34d64f06c52f8ad6576 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-0884
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-0894
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-00833
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-00894
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-00831
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-00853
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-00783
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-0086
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-249
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-2488 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J19-249
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J19-088
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J19-0093 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J19-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J19-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J19-24 |
| filingDate |
2016-12-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fc9d72eef87886da907f26b5f5792b60
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_828ad1c3f722040f989dee20e9d31361
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5d0302d1ab7d7e934054cb463aa4bb79 |
| publicationDate |
2018-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2018369778-A1 |
| titleOfInvention |
Diphasic Gas/Liquid Plasma Reactor |
| abstract |
The present invention relates to a microfluidic or millifluidic device ( 1 ) comprising: —a support ( 2 ) made at least partially of a dielectric material, the support ( 2 ) comprising a first inlet ( 21 a ) adapted to be connected to a first reservoir containing gas, a second inlet ( 21 b ) adapted to be connected to a second reservoir containing liquid, an outlet ( 22 ) adapted to be connected to a receiver container containing gas and/or liquid, and a main microchannel or millichannel ( 3 ) present in the dielectric material allowing the liquid and the gas to flow from the inlets towards the outlet, —one or several ground electrode(s) ( 4 ) embedded in said dielectric material and extending along the main microchannel or millichannel ( 3 ), and —one or several high-voltage electrode(s) ( 5 ) embedded fi in said dielectric material and extending along the main microchannel or millichannel ( 3 ), wherein the high-voltage electrode(s) ( 5 ) and the ground electrode(s) ( 4 ) are located on opposite sides of the main microchannel or millichannel ( 3 ) so as to be able to generate an electric field inside the main microchannel or millichannel ( 3 ). The present invention relates also to a method for generating a plasma in a continuous manner using such a microfluidic or millifluidic device ( 1 ). |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2018099257-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10625235-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11388808-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-114672335-A |
| priorityDate |
2015-12-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |