http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2018347038-A1

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8321a4d88d3c45cbb4a9ebf4e9c07ec4
classificationCPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1617
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-187
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-244
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1682
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1664
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1619
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-54
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-187
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4482
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-56
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-14
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-56
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-448
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C18-54
filingDate 2017-05-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e9e8c8e5e76210f4779500e780a3fa2f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6a232ef37c053428cb3a9fb19f72efe9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f6b9e1dc4a5e4764b485b0c6785dc116
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d5f9ba6e223df47265eb3e09fdab3f44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5a9fac9c22fe652dd9d7b3a338108a84
publicationDate 2018-12-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2018347038-A1
titleOfInvention Elimination of H2S in Immersion Tin Plating Solution
abstract Upon use of an immersion tin plating solution, contaminants build in the solution, which cause the plating rate and the quality of the plated deposit to decrease. One primary contaminant, which builds in the plating solution upon use, is hydrogen sulfide, H 2 S. If a gas is bubbled or blown through the solution, contaminants, especially hydrogen sulfide, can be effectively removed from the solution and, as a result, the high plating rate and plate quality can be restored or maintained. In this regard, any gas can be used, however, it is preferable to use a gas that will not detrimentally interact with the solution, other than to strip out contaminants. Nitrogen is particularly preferred for this purpose because it is efficient at stripping out contaminants, including hydrogen sulfide, but does not induce the oxidation of the tin ions from their divalent state to the tetravalent state, which is detrimental.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-4108804-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-112647066-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11408076-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3805425-A1
priorityDate 2017-05-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419524915
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID449832830
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419542628
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID8761
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID3083879
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419524179
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23689363
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID4765
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID22497
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID402
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID66055
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID21654078
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415966169
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID2723790
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5352426
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419579089
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID75982
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID448668183
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID77731
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID18465
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID10752072
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID359
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID438258
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID7615
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23662383
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID447556883
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID16741157
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457778337
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID18522924
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559526
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID160910
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID454511054
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID414884227
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457766247
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419530817
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID413956857
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID410442060
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID454635231
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID423346205
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID947
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID408496368
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID8758
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID421351823
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419556970
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID451785600
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID16128106
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559356
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419486281
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID409410088
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID408237334
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID421289560
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419546714
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID414864150
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID451536570
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID27099
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID8773
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419484381
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID414862405
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID50909822
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID17507
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID159865
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID9863446
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23978
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID454244314
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23675242
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID1549517
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID454316624
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID418354341

Total number of triples: 101.