| abstract |
A method of forming a self-cleaning film system includes depositing a photocatalytic material onto a substrate to form a first layer. The method also includes disposing a photoresist onto the first layer and then exposing the photoresist to light so that the photoresist has a developed portion and an undeveloped portion. The method includes removing the undeveloped portion so that the developed portion protrudes from the first layer. After removing, the method includes depositing a perfluorocarbon siloxane polymer onto the first layer to surround and contact the developed portion. After depositing the perfluorocarbon siloxane polymer, the method includes removing the developed portion to thereby form the self-cleaning film system. |