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publicationDate 2018-10-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2018286899-A1
titleOfInvention Method of manufacturing optical semiconductor device
abstract A method of manufacturing an optical semiconductor device includes preparing a semiconductor substrate having a plurality of photoelectric conversion parts, forming a trench in the semiconductor substrate to separate the plurality of photoelectric conversion parts from each other, forming a boron layer on an inner surface of the trench by a vapor phase growth method, and forming an accumulation layer in the semiconductor substrate along the inner surface of the trench by performing a thermal diffusion treatment on the boron layer.
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