http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2018286768-A1

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_7405c8c600d1d4c9bd348a3e56997a5f
classificationCPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3288
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01J3-443
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L22-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32853
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01J3-0218
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32963
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01J3-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-66
filingDate 2018-03-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_32ce01eec64b271d375dde3c0ae5fec1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1e1d61cbbcc955ce852d4f4f390172b6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d29f21276f07b7dd69a4de03e150dcd2
publicationDate 2018-10-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2018286768-A1
titleOfInvention Methods for optical endpoint detection using an endpoint booster
abstract Plasma etching a semiconductor wafer in a vacuum etch chamber includes transmitting an optical signal through an aperture in an endpoint booster that is coupled to a vacuum side of the vacuum etch chamber, analyzing the optical signal to determine an endpoint of the plasma etch process, ending the plasma etch process when the optical signal reaches a first threshold, and cleaning the viewport when the optical signal is below a second threshold. The endpoint booster inhibits process byproducts from accumulating on the viewport during the plasma process, which increases the time between chamber cleanings. The reduction in chamber downtime for cleaning increases production throughput.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022015999-A1
priorityDate 2014-07-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2003000546-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014024142-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005189069-A1
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419491804
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5359268

Total number of triples: 27.