| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1af8df51ce24ca931ae718fb747f6aa0 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C2059-023 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C59-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C59-002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29D11-00865
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C59-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C59-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29D11-00 |
| filingDate |
2018-05-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_56c3813559509189f67d33d287585247
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a4a27a932caaa3821e0324178830105a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0de78db2b49186c71fcb7cdd2f1bcea5 |
| publicationDate |
2018-09-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2018272634-A1 |
| titleOfInvention |
Substrate Pretreatment for Reducing Fill Time in Nanoimprint Lithography |
| abstract |
A nanoimprint lithography method includes disposing a pretreatment composition on a substrate to form a pretreatment coating. The pretreatment composition includes a polymerizable component. Discrete imprint resist portions are disposed on the pretreatment coating, with each discrete portion of the imprint resist covering a target area of the substrate. A composite polymerizable coating is formed on the substrate as each discrete portion of the imprint resist spreads beyond its target area. The composite polymerizable coating includes a mixture of the pretreatment composition and the imprint resist. The composite polymerizable coating is contacted with a template, and is polymerized to yield a composite polymeric layer on the substrate. The interfacial surface energy between the pretreatment composition-and air exceeds the interfacial surface energy between the imprint resist and air or between at least a component of the imprint resist and air. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11037785-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10509313-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10488753-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10935884-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10620539-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11597137-B2 |
| priorityDate |
2015-09-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |