| abstract |
A double-face polishing device and a method capable of controlling rigidity of a polishing pad through a cluster dynamic magnetic field are provided. A whole process from double-face rough polishing to precision polishing of a workpiece is implemented by adjusting a rigidity of a flexible polishing pad. The double-face polishing device capable of controlling rigidity of a polishing pad through a cluster dynamic magnetic field includes a variable-rigidity cluster magnetically-controlled polishing pad generating mechanism, a workpiece fast clamping mechanism and a workpiece movement driving mechanism. The variable-rigidity cluster magnetically-controlled polishing pad generating mechanism includes a first magnetic field generating block and a second magnetic field generating block that are symmetrically arranged, wherein the first magnetic field generating block and the second magnetic field generating block each include a shell, a deflection spindle, an eccentric camshaft, a magnet mounting base, a permanent magnet and a motor, the workpiece fast clamping mechanism includes a working tank, a clamping plate, a connection rod, a hinge plate, a fixing hinge, a square magnet, an electrical soft iron block, an annular cast iron and a strip-shaped permanent magnet, and the workpiece movement driving mechanism includes a support block, a cross beam, a horizontal linear motor, a vertical beam and a vertical linear motor. |