http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2018226217-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d966dff85e9c2a430558a6266ef1422a |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F03H1-0075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J27-143 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J27-146 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J27-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/F03H1-00 |
| filingDate | 2018-02-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_688b29fcac97570f3ef9da42076f8742 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f646a69833d7e58376717d055e6a40c3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f8adc16dda311bc4df214b137f0c58fb http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bedc7d664f0447ca24016f6e0b987c59 |
| publicationDate | 2018-08-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-2018226217-A1 |
| titleOfInvention | Hall current plasma source having a center-mounted cathode or a surface-mounted cathode |
| abstract | A miniature Hall current plasma source apparatus having magnetic shielding of the walls from ionized plasma, an integrated discharge channel and gas distributor, an instant-start hollow cathode mounted to the plasma source, and an externally mounted keeper, is described. The apparatus offers advantages over existing other Hall current plasma sources having similar power levels, including: lower mass, longer lifetime, lower part count including fewer power supplies, and the ability to be continuously adjustable to lower average power levels using pulsed operation and adjustment of the pulse duty cycle. The Hall current plasma source can provide propulsion for small spacecraft that either do not have sufficient power to accommodate a propulsion system or do not have available volume to incorporate the larger propulsion systems currently available. The present low-power Hall current plasma source can be used to provide energetic ions to assist the deposition of thin films in plasma processing applications. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111852803-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109707584-A |
| priorityDate | 2017-02-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 25.