| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-334
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32449 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32174
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32137
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67069 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311 |
| filingDate |
2017-12-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_35dd8d4c5b1ad6b0cc60b820c87def93
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a2d2e7982c114dc313e957f439abccd3 |
| publicationDate |
2018-06-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2018166303-A1 |
| titleOfInvention |
Method of selectively etching first region made of silicon nitride against second region made of silicon oxide |
| abstract |
Generation of a deposit can be suppressed and high selectivity can be acquired when etching a first region made of silicon nitride selectively against a second region made of silicon oxide. A method includes preparing a processing target object having the first region and the second region within a chamber provided in a chamber main body of a plasma processing apparatus; generating plasma of a first gas including a gas containing hydrogen within the chamber to form a modified region by modifying a part of the first region with active species of the hydrogen; and generating plasma of a second gas including a gas containing fluorine within the chamber to remove the modified region with active species of the fluorine. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11398381-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10515814-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2017178894-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10431470-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10312102-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10861693-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11139175-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2021066074-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10446405-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10950428-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10304688-B2 |
| priorityDate |
2016-12-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |