| abstract |
The present invention provides a tetracarboxylic acid diester compound represented by the following general formula (1), n n n n n n n n n n n n wherein, X 1 represents a tetravalent organic group, and R 1 represents a group represented by the following general formula (2), n n n n n n n n n n n n n n n n wherein, the dotted line represents a bonding, Y 1 represents an organic group with a valency of k+1, Rs represents a group containing at least one silicon atom, âkâ represents 1, 2 or 3, and ânâ represents 0 or 1. There can be provided a tetracarboxylic acid diester compound which can lead a polymer of a polyimide precursor capable of using a base resin of a negative photosensitive resin composition which is capable of forming a fine pattern and giving high resolution, a polymer of a polyimide precursor obtained by using the tetracarboxylic acid diester compound and a method for producing the same. |