| abstract |
A pattern forming method includes at least (i) forming a film on a substrate, using an actinic ray-sensitive or radiation-sensitive resin composition, (ii) irradiating the film with actinic rays or radiation, and (iii) developing the film irradiated with actinic rays or radiation, using a developer containing an organic solvent, in which the actinic ray-sensitive or radiation-sensitive resin composition contains a resin P and a compound that generates an acid upon irradiation with actinic rays or radiation, the resin P has a specific repeating unit Q1 represented by General Formula (q1) and a specific repeating unit Q2 represented by General Formula (q2), and the content of the repeating unit Q2 with respect to all the repeating units of the resin P is 20% by mole or more. |