| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b3310ea86f3c492f6c09d7be6592866d |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H03H2003-023
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H03H2003-021
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H03H2009-02173
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H03H2003-0442
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H03H9-547 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H03H9-174
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H03H9-173
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H03H9-02015
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H03H9-132
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H03H3-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H03H9-02118
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H03H9-02086 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H03H9-13
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H03H9-17
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H03H3-04 |
| filingDate |
2017-09-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0fde9c575f7e15bbf01bffe8b9db6932
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_16431e6a9f1fd80a535b3bc909321863
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9f281ff73afafcc042a602b9f71bb033
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_45bcccc603943e3855b868dea10ff9ac |
| publicationDate |
2018-04-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2018102751-A1 |
| titleOfInvention |
Bulk-acoustic wave resonator and method for manufacturing the same |
| abstract |
A bulk-acoustic wave resonator includes: a membrane layer disposed on a substrate and forming a cavity; a lower electrode disposed on the membrane layer; a piezoelectric layer disposed on the lower electrode; an upper electrode disposed on the piezoelectric layer, and including a frame part disposed at an edge of an active area and having a thickness greater than that of a portion of the upper electrode disposed in a central portion of the active area; and a frequency adjusting layer disposed on the piezoelectric layer and the upper electrode. The frequency adjusting layer is excluded from an inclined surface of the frame part, or a thickness of a portion of the frequency adjusting layer on the inclined surface is less than that of other portions of the frequency adjusting layer. The frequency adjusting layer is disposed on a portion of the piezoelectric layer protruding from the upper electrode. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111817687-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110829998-A |
| priorityDate |
2016-10-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |