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filingDate 2016-09-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a201e2528d424a5d0cc2b1bf95cc6747
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publicationDate 2018-03-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2018079893-A1
titleOfInvention Low wear debris polyoxymethylene composition and a ramp made of such polyoxymethylene composition suitable for various hdd designs
abstract A polyoxymethylene composition includes a polyoxymethylene copolymer with 1,3-dioxolane as a comonomer, a wear resistance agent, a nucleating agent, and an antistatic agent. A ramp is made of the polyoxymethylene composition. The ramp and the polyoxymethylene have excellent low-wear-debris property. The low wear debris polyoxymethylene composition can be used to produce a ramp for many different designs of hard disks, such as PMR (perpendicular recording)+TDMR (Two-Dimensional Magnetic Recording), SMR (Shingled Magnetic Recording), HAMR + (HAMR (Heat Assisted Magnetic Recording)+SMR+TDMR), BPMR + (BPMR (Bit Pattern Media Recording)+SMR+TDMR), and helium-filled hard disk.
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