| abstract |
Provided are: an aromatic sulfonium salt compound which exhibits low corrosion to a substrate and excellent photolithographic characteristics and is thus useful as a photoacid generator and as a cationic polymerization agent; and a photoacid generator, a resist composition, a cationic polymerization initiator and a cationically polymerizable agent composition, which include the aromatic sulfonium salt compound. The aromatic sulfonium salt compound is represented by the following Formula (I): n n n n n n n n n n n n (wherein, R 1 to R 10 each independently represent a hydrogen atom, a halogen atom, a hydroxyl group, a nitro group, a cyano group, an alkyl group having 1 to 18 carbon atoms which is optionally substituted, or the like; R 11 to R 15 each independently represent a hydrogen atom, an alkoxy group having 1 to 18 carbon atoms which is optionally substituted, or the like; at least one of R 11 to R 15 is not a hydrogen atom; and X 1 − represents a monovalent organic sulfonate anion). |