abstract |
An object of the invention is to provide a thin film manufacturing device which further reduces a load on a substrate. Provided is a thin film manufacturing device for forming a thin film on a substrate by supplying a mist of a solution including a thin-film forming material to the substrate, characterized in that the device includes: a plasma generation unit including a first electrode and a second electrode disposed closer to one surface of the substrate, which generates plasma between the first electrode and the second electrode; and a mist supply unit which passes the mist between the first electrode and the second electrode and supplies the mist to the substrate. |