Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_9047b16961c0aee78d7de367969339b2 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32115 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-68764 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30604 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6708 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67086 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-687 |
filingDate |
2017-11-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2be0caf9c0c9547b92cc30804fefb65d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_eecc0e1c86a99ddd54355a90f4b2d100 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2caf8600d8c5ced4a6f4cde04129dbb4 |
publicationDate |
2018-03-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-2018061654-A1 |
titleOfInvention |
Manufacturing method of semiconductor device and semiconductor device manufacturing apparatus |
abstract |
In accordance with an embodiment, a manufacturing method of a semiconductor device includes bringing a first catalyst into contact with a workpiece to form an oxide film on a surface of the workpiece, and bringing a second catalyst different from the first catalyst and the oxide film into contact with each other or moving the second catalyst and the oxide film closer to each other to elute the oxide film into a treatment liquid. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10991588-B2 |
priorityDate |
2015-09-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |