| abstract |
A charge stripping film for an ion beam includes a single layer body of a graphitic film having a carbon component of at least 96 at % and a thermal conductivity in a film surface direction at 25° C. of at least 800 W/mK, or a laminated body of the graphitic film. The charge stripping film has a thickness of 100 nm to 10 μm, a tensile strength in a film surface direction of at least 5 MPa, a coefficient of thermal expansion in the film surface direction of at least 1×10 −5 /K, and an area of at least 4 cm 2 . |