http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2018047561-A1

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_36333273e27f0db23ddddbf80ba79ba7
classificationCPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02282
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02266
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02126
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0276
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0332
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02118
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0271
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02343
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0752
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3081
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-266
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0226
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31144
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0035
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-266
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02
filingDate 2016-11-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5a5123925a9a27c2a66dc70d075424a9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6896a66c6343a1c2f4681c273dd3a686
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_be0a437fe660aa033dfb7ce2dea57d1f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_caf025faa401ef4e4eee2223956db24e
publicationDate 2018-02-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2018047561-A1
titleOfInvention Lithography Method with Surface Modification Layer
abstract A lithography method is provided in accordance with some embodiments. The lithography method includes forming a surface modification layer on a substrate, the surface modification layer including a hydrophilic top surface; coating a photoresist layer on the surface modification layer; and developing the photoresist layer, thereby forming a patterned photoresist layer.
priorityDate 2016-08-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5461123
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419523291
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID449779615
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID458396226
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID11729320
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID65093
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID977
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID3670169
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419557764
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419512635
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID31170
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID451203358
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419474493
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559541
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID411318299
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5182128
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID456373471
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID458393349
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID7946
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID411297080
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID409021766
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID456438411
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559473
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID90475721
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419577416
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID19881796
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID21910289
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID25423
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID7900
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID222
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID9550
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419546360
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID448674543
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID458396401
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID25517
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID458394811
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID420256138
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID10039
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID962
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID458397310
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID91500
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559499
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID416391341
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID458392451
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID431577372
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419579030
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419522147
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419596525

Total number of triples: 81.