http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2018046085-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-38 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-38 |
| filingDate | 2017-10-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_40ff23e89b8b5ae724161487f991d3f3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_78e08906f4cf6a1a02c756f43948f2c6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_92013007c52d3c1545daa7dd640fb5fe |
| publicationDate | 2018-02-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-2018046085-A1 |
| titleOfInvention | Field guided post exposure bake application for photoresist microbridge defects |
| abstract | Embodiments described herein generally relate to methods for mitigating patterning defects. More specifically, embodiments described herein relate to utilizing field guided post exposure bake processes to mitigate microbridge photoresist defects. An electric field may be applied to a substrate being processed during a post exposure bake process. Photoacid generated as a result of the exposure may be moved along a direction defined by the electric field. The movement of the photoacid may contact microbridge defects and facilitate the removal of the microbridge defects from the surface of a substrate. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2021041785-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2022390847-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022060482-A1 |
| priorityDate | 2015-04-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 27.