| abstract |
A resist composition includes a base material component and a fluorine additive component. The fluorine additive component contains a fluororesin component having a structural unit containing a base dissociable group. The base material component contains a structural unit containing an acid-decomposable group in an amount of 30 mol % or more and an amount of 10 mol % or more of a resin component having a structural unit represented by formula (a10-1): n n n n n n n n n n where R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms, Ya x1 is a single bond or a divalent linking group, Wa x1 is a (n ax1 +1) valent aromatic hydrocarbon group, and na x1 is an integer of 1 to 3. |