Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e757fd4fedc4fe825bb81b1b466a0947 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-05076 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-05149 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-05687 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-03426 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-80075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-05147 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-80359 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L24-94 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-03416 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-05124 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-80357 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-05576 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-8034 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-0348 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-80896 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-80895 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-94 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-0361 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-03848 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-03845 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-08145 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-80986 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-0381 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-05624 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-0346 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-05649 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-05647 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L24-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-05187 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-83203 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-03452 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-83143 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-0345 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-0519 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-83896 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L25-0657 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L24-83 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L24-80 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-48 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L24-05 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L24-03 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L24-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L25-50 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L25-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L25-065 |
filingDate |
2016-06-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a8ac2a5842aea96cd48c4f67bc65fd07 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dd1eff20686f563ab9b55803b4d60ae6 |
publicationDate |
2018-01-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-2018005978-A1 |
titleOfInvention |
Method for wafer-wafer bonding |
abstract |
A first semiconductor structure including a first bonding oxide layer having a first metallic bonding structure embedded therein and a second semiconductor structure including a second bonding oxide layer having a second metallic bonding structure embedded therein are provided. A nitride surface treatment process is performed to provide a nitrided surface layer to each structure. Each nitrided surface layer includes nitridized oxide regions located in an upper portion of the bonding oxide layer and nitridized metallic regions located in an upper portion of the metallic bonding structures. The nitrogen within the nitridized metallic regions is then removed to restore the upper portion of the metallic bonding structures to its original composition. Bonding is performed to form a dielectric bonding interface between the nitridized oxide regions present in the first and second structures, and a metallic bonding interface between the first and second metallic bonding structures. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11195748-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2023050648-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11373953-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11362067-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10964664-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11114433-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2021375724-A1 |
priorityDate |
2016-06-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |