| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5d9f3ca41550d315642580237250c5b0 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-78603
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0228
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-66969
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-1218
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02554
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02565
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-1262
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-127
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-7869
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02642
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0262
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-66
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-786
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 |
| filingDate |
2016-06-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f6ae4015c593928013397033ce73bdcc |
| publicationDate |
2017-12-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2017352691-A1 |
| titleOfInvention |
Method for selective thin film deposition |
| abstract |
A method device is prepared with a patterned thin film that can include one or more metal oxides on a suitable substrate. Initially, a pattern of a deposition inhibitor is provided on a surface of the substrate, which deposition inhibitor comprises at least one cellulose ester. This pattern has both inhibitor areas where the deposition inhibitor is present and open areas where the deposition inhibitor is absent. An inorganic thin film is then deposited on the surface of the substrate by a chemical vapor deposition process only in the open areas of the pattern. Further operations can be carried out including deposit of a second inorganic thin film exactly over the initial inorganic thin film, the deposition inhibitor can be removed from the inhibitor areas of the pattern, or both operations can be carried out in sequence. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2021062338-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2018238750-A1 |
| priorityDate |
2016-06-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |