| abstract |
A composition for forming an interlayer insulating film including a polymerizable monomer, an imide compound represented by general formula (z-1), a reaction promoter which promotes the polymerization of the polymerizable monomer and the imide compound, and a polymerization initiator, an interlayer insulating film containing a polymerized product thereof, a method for forming an interlayer insulating film pattern, and a device including the interlayer insulating film on a support. In the formula (z-1), R 1 and R 2 represent a hydrogen atom or an alkyl group having 1 to 5 carbon atoms. R Z 00 represents a divalent organic group containing an aliphatic hydrocarbon group and/or an aromatic hydrocarbon group, R z 01 and R z 02 represent an alkyl group or an alkoxy group, and n 1 and n 2 are 0 or 1. |