http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2017275437-A1

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filingDate 2017-03-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2017-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2017275437-A1
titleOfInvention Functionalized f-poss materials as additives to polymers
abstract Functionalized fluoro polyhedral oligomeric silsesquioxane (F-POSS) materials as additives to improve liquid repellence of various polymers, the additive including at least one functionalized F-POSS material, wherein the functional group is at least one material selected from the group consisting of amines, isocyanates, epoxies, carboxylic acids, and esters.
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