http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2017260421-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d3082cd39bb800686b9abbb8aa05c80b |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F3-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-044 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3212 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F3-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-321 |
| filingDate | 2017-05-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_10061144ae84c9e385b66cfc4fda1a5d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9fe7b59e53c5b5819bc4ad41ce83aa28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c2a1b1a072fd24c662cba5a72091d48c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ed9361e642e0dd154d27ed6c79b96320 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cb4411c9cf4d63cb565a90ebcd44935e |
| publicationDate | 2017-09-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-2017260421-A1 |
| titleOfInvention | Cobalt polishing accelerators |
| abstract | The invention provides a chemical-mechanical polishing composition comprising (a) abrasive particles, (b) a cobalt accelerator selected from a compound having the formula: NR 1 R 2 R 3 wherein R 1 , R 2 , and R 3 are independently selected from hydrogen, carboxyalkyl, substituted carboxyalkyl, hydroxyalkyl, substituted hydroxyalkyl and aminocarbonylalkyl, wherein none or one of R 1 , R 2 , and R 3 are hydrogen; dicarboxyheterocycles; heterocyclylalkyl-α-amino acids; N-(amidoalkyl)amino acids; unsubstituted heterocycles; alkyl-substituted heterocycles; substituted-alkyl-substituted heterocycles; N-aminoalkyl-α-amino acids; and combinations thereof, (c) a cobalt corrosion inhibitor, (d) an oxidizing agent that oxidizes a metal, and (e) water, wherein the polishing composition has a pH of about 3 to about 8.5 . The invention further provides a method of chemically-mechanically polishing a substrate with the inventive chemical-mechanical polishing composition. Typically, the substrate contains cobalt. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11732157-B2 |
| priorityDate | 2014-10-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 90.