http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2017204508-A1

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filingDate 2015-07-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4f98ec1fc997e1818f88bbe612022846
publicationDate 2017-07-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2017204508-A1
titleOfInvention Process for Physical Vapor Deposition of a Material Layer on Surfaces of a Plurality of Substrates
abstract The present invention relates to a process of physical vapor deposition of a material layer on surfaces of a plurality of substrates ( 11 ), wherein:—the plurality of substrates ( 11 ) are arranged on a dome ( 12 ) which rotates according to a dome rotation axis ( 300 );—the material to be deposited is vacuum evaporated thanks to an energy beam from a target ( 13 );—the energy beam interacts with a beam impact surface of the target chosen within the list consisting of a part of a main surface ( 15 ) and a part of an edge ( 14 ) of the target and wherein the material diffuses from the target to the substrates around a main diffusion axis ( 100 ) which intersects the dome ( 12 ) at an intersection point, I; and—the angle α between the dome rotation axis ( 300 ) and the main diffusion axis ( 100 ) is chosen within the ranges of +5° to +40° or −5° to −40°.
priorityDate 2014-07-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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