| abstract |
The present invention provides a photosensitive resin composition having good developing performance, which belongs to the technical field of polymer material, so as to solve the problem of the poor developing performance of the current photosensitive resin composition. The photosensitive resin composition comprising: based on the total mass of the photosensitive resin composition, 5% to 45% of an alkali-soluble resin, 5% to 40% of an unsaturated monomer having polyffunctional groups, 1% to 10% of a photoinitiator, 10% to 60% of a pigment dispersion, 0% to 5% of an addition, and 20% to 70% of a solvent. In the present invention, tetrahydrofuran groups (flexible functional group) is introduced into the alkali-soluble resin by highly reactive unsaturated monomer, which can improve the developing property of the alkali-soluble resin and can produce a photoresist film with a smooth surface and no corrosion on its side wall. |