| abstract |
The present invention provides a novel resist underlayer film-forming composition capable of forming a resist underlayer film that has etching resistance and excellent embeddability in a surface having concave portions and/or convex portions. A resist underlayer film-forming composition comprising a polymer having a structural unit represented by formula (1) or formula (2): n n n n n n n n n n (wherein X is an arylene group, n is 1 or 2, and R 1 , R 2 , R 3 , and R 4 are each independently a hydrogen atom, a hydroxy group, a C 1-3 alkyl group, or a phenyl group), and a solvent. |