http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2017133475-A1

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filingDate 2015-10-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2017-05-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2017133475-A1
titleOfInvention Low temperature poly-silicon thin film transistor and manufacturing method thereof
abstract A low temperature poly-silicon thin film transistor and a manufacturing method thereof are disclosed. The method includes forming an active layer on a base substrate, forming an ohmic contact layer on the active layer through an atomic layer deposition process, and forming a source electrode and a drain electrode on the ohmic contact layer. The ohmic contact layer includes a plurality of conductive ionic layers and a plurality of monocrystalline silicon layers/poly-silicon layers. The source electrode and the drain electrode are in contact with the active layer through the ohmic contact layer.
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