| abstract |
The present disclosure discloses an array substrate and a method of preparing the array substrate. The method comprises providing a substrate having a display area thereon and forming a plurality of pixel structures in said display area. At least one of the plurality of pixel structures is prepared through the following procedures: forming successively, on the substrate, a patterned first metal layer which has a gate line and a floating metal pattern that is insulative to the gate line, a gate insulation layer, and a patterned second metal layer which has a data line, a source, and a drain, wherein the data line is arranged in correspondence with the floating metal pattern and spaced from the floating metal pattern through the gate insulation layer. The array substrate of the present disclosure can increase capacitance for storage of the static electricity generated in a dry plasma bombardment of the second metal layer, thus preventing electrostatic breakdown caused by insufficient capacitive storage. |