Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c16d2144a81bfa32a665dca1e93c3d37 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2021-8861 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2021-8887 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67288 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-8851 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-9501 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-88 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-95 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67 |
filingDate |
2016-06-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2789881421cf6c6713b0b417df79dd60 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_350303740ebc511f46cf5ed0e9b23af2 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8138959b25129c0dbd895264d1e22f20 |
publicationDate |
2017-04-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-2017115233-A1 |
titleOfInvention |
Apparatus for inspecting wafer |
abstract |
A wafer inspection apparatus including a derivation unit configured to derive a first polar coordinate set and a second polar coordinate set using a latin hypercube sampling, the first and second polar coordinate sets not overlapping each other, an inspection unit configured to perform defect inspections of a plurality of wafers using the first and second polar coordinate sets, a support unit configured to support the wafers, and an calculation unit configured to combine a defect inspection result using the first polar coordinate set with a defect inspection result using the second polar coordinate set may be provided. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-108492282-A |
priorityDate |
2015-10-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |