| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c5520dd38cc403678d9f91e0b0ee95fb |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K50-00 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K71-191
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L51-56
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L51-0011
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K71-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-042
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L51-0012
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K71-166 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L51-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L51-56
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-12 |
| filingDate |
2015-06-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7a8847743cf94b49f87d402f5e1b1ec6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bb2da4041e2f358a23f62df3f017d401
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ceb22811d0d9a50e9d953b28ee6f1457
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0c7faaa368eeba6d544f4a6b0d3d7fc0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e7fd37c70898e7a6b6b26b0a27d3dced |
| publicationDate |
2017-04-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2017104158-A1 |
| titleOfInvention |
Vapor deposition method and vapor deposition apparatus |
| abstract |
A vapor deposition apparatus includes: a vapor deposition source having a plurality of vapor deposition source apertures that emit vapor deposition particles; a restriction plate unit having a plurality of restriction apertures; and a vapor deposition mask in which a plurality of mask apertures are formed only within a plurality of vapor deposition regions at which vapor deposition particles passing through the plurality of restriction apertures arrive. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10170731-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110453221-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110098239-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2017309868-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2022310702-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2021348265-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2017130320-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11626560-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11732347-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11275315-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2021123129-A1 |
| priorityDate |
2014-06-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |