| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ed62b7551998e54b35784cdbbb2778d5 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67109 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-303
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32051
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28088
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-455
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45523
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28562
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28568
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45534 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-285
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-06 |
| filingDate |
2016-09-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7192211cc09ba70380ba53c1883dbecf |
| publicationDate |
2017-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2017092503-A1 |
| titleOfInvention |
Method of manufacturing a semiconductor device |
| abstract |
A method of manufacturing a semiconductor device includes: forming a film on a substrate by time-divisionally and sequentially performing: (a) supplying a precursor gas to the substrate and causing precursor molecules, which are contained in the precursor gas and which contains a main element and ligands, to be adsorbed onto the substrate; (b) supplying a compound containing an electron, withdrawing group to the substrate onto which the precursor molecules are adsorbed, and causing the compound containing the electron withdrawing group to be adsorbed to the ligands contained in the precursor molecules; and (c) supplying a reaction gas to the substrate onto which the precursor molecules and the compound containing the electron withdrawing group are adsorbed, causing the ligands and the compound containing the electron withdrawing group to be desorbed from the substrate, and causing the main element contained in the precursor molecules to react with the reaction gas. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2019243392-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10649471-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10600642-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11746416-B2 |
| priorityDate |
2015-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |