Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5e5c121269689cbab9b3a4548b15caf3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2032 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-322 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-70025 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2053 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2047 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-162 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-203 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-32 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-38 |
filingDate |
2016-08-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6ad3befff45fe73b6ae1e1e0cc59af53 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5644b22d707db81a9d4a73071213c7ac http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6fd291c8dab5d42ec20c6a75746c87c1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_783eaecfcf82a91838dfc0ea4b09878b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_39813372c4c5022993a3d3affa172820 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8353e5b6004540db02bd6252fd50545c |
publicationDate |
2017-02-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-2017052450-A1 |
titleOfInvention |
Pattern-forming method |
abstract |
A pattern-forming method comprises applying a chemically amplified resist material on an antireflective film formed on a substrate to form a resist material film. The resist material film is patternwise exposed to ionizing radiation or nonionizing radiation having a wavelength of no greater than 400 nm. The resist material film patternwise exposed is floodwise exposed to nonionizing radiation having a wavelength greater than the nonionizing radiation for the patternwise exposing and greater than 200 nm. The resist material film floodwise exposed is baked. The resist material film baked is developed with a developer solution. An extinction coefficient of the antireflective film for the nonionizing radiation employed for the floodwise exposing is no less than 0.1. The chemically amplified resist material comprises a base component and a generative component that is capable of generating a radiation-sensitive sensitizer and an acid upon an exposure. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2019064665-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10551743-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10586697-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10048594-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11163236-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10096528-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10534266-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11215926-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11309452-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10429745-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10867798-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10522428-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110955112-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10629441-B2 |
priorityDate |
2015-08-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |