http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2017048957-A1

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filingDate 2015-08-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_766b8723e240dc76b1173c65c9fac735
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publicationDate 2017-02-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2017048957-A1
titleOfInvention Target Expansion Rate Control in an Extreme Ultraviolet Light Source
abstract A method includes providing a target material that comprises a component that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first beam of radiation toward the target material to deliver energy to the target material to modify a geometric distribution of the target material to form a modified target; directing a second beam of radiation toward the modified target, the second beam of radiation converting at least part of the modified target to plasma that emits EUV light; measuring one or more characteristics associated with one or more of the target material and the modified target relative to the first beam of radiation; and controlling an amount of radiant exposure delivered to the target material from the first beam of radiation based on the one or more measured characteristics to within a predetermined range of energies.
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