| abstract |
A resistive random access memory (RRAM) structure includes a resistive memory element formed on a semiconductor substrate and designed for data storage. The resistive element includes a resistive material layer. The resistive element further includes first and second electrodes interposed by the resistive material layer. The resistive element further includes a field effect transistor (FET) formed on the semiconductor substrate and coupled with the resistive memory element, wherein the FET includes asymmetric source and drain, the drain having a higher doping concentration than the source. The resistive memory element is coupled with the drain. |