| abstract |
The present invention discloses an organic thin film transistor array substrate and a fabrication method thereof. The fabrication method is that a metal layer is first deposited successively on a substrate and followed by depositing a layer of Indium Tin Oxide (ITO), and then a photoresist layer is covered thereon to form a data line, a source electrode, a drain electrode and a pixel electrode by a first mask process. Subsequently, an organic semiconductor layer, a gate electrode, a scanning line, and a passivation layer are formed successively. Finally, a region where the pixel electrode, i.e. an anode of an OLED device, is situated and covered with the passivation layer is excavated an opening and allowing the underlying pixel electrode to be exposed to the outside. Then, a layer of OLED material is deposited on the exposed ITO pixel electrode to form an OLED device. |