| abstract |
The present disclosure pertains to the technical field of display, which relates to a manufacturing method of a thin film transistor and a thin film transistor, and an array substrate. The manufacturing method of a thin film transistor comprises: forming, above a substrate, patterns comprising different surface energies; coating, above said substrate, a composite solution containing organic semiconductor material and polymer insulating material, and forming a composite film layer; patterning said composite film layer according to the patterns with different surface energies above said substrate, preserving said composite film layer corresponding to the pattern areas with relatively high surface energies; layering said patterned composite film layer by means of an organic solvent steam treatment method; forming two separate metal electrodes at two opposite sides of said patterned composite film layer. |