| abstract |
A semiconductor device may include a semiconductor substrate and first transistors having a first operating voltage. Each first transistor may include a first channel and a first punch-through stop (PTS) layer in the semiconductor substrate, and the first PTS layer may be at a first depth below the first channel. The semiconductor device may further include second transistors having a second operating voltage higher than the first operating voltage. Each second transistor may include a second channel and a second PTS layer in the semiconductor substrate, and the second PTS layer may be at a second depth below the second channel that is greater than the first depth. Furthermore, the first channel may include a first superlattice, and the second channel may include a second superlattice. |