| abstract |
The invention relates to a process that enables the creation of nanometric structures by self-assembly of block copolymers, at least one of the blocks of which results from the polymerization of monomers comprising at least one cyclic entity corresponding to the formula I. n n n n n n n n n n where X═Si(R 1 ,R 2 ); Ge(R 1 ,R 2 )n Z═Si(R 3 ,R 4 ); Ge(R 3 ,R 4 ); O; S; C(R 3 ,R 4 ) Y═O; S; C(R 5 ,R 6 ) T=O; S; C(R 7 ,R 8 ) nn R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , R 8 are selected from hydrogen, linear, branched or cyclic alkyl groups, with or without heteroatoms, and aromatic groups with or without heteroatoms. |