| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ddbd9538efce6e134d471b912946264e |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-80 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-80
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-26 |
| filingDate |
2015-08-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6034bcadffa0123dd4886aeab7ac4abd |
| publicationDate |
2016-11-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2016327855-A1 |
| titleOfInvention |
Phase shift mask and method of fabricating the same |
| abstract |
Provided is a phase shift mask including a substrate, a phase shift layer, and a shielding layer. The phase shift layer is located on the substrate. A pattern of the phase shift layer includes a main pattern and sub-resolution assist features (SRAFs). The SRAFs are disposed around the main pattern. The phase shift layer has a transmission, and the transmission is larger than 6%. The shielding layer at least covers the SRAFs of the phase shift layer. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109917616-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10955739-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019108164-A1 |
| priorityDate |
2015-05-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |