| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a3d52eacd83e723ebd2ca61b598586c2 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2201-061
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06T2207-30148
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2201-06113
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2201-068 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-9501
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L22-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06T7-0006
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06T7-0008
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06T7-001
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67288 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-66
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G06T7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-95 |
| filingDate |
2016-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_583dd03dac1ad8bcccc86b92b5b5b051
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4643f875c2ed83e14032dcb3a5879506
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c1c6a1306e2d97fdb9062f59da108171
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_06ec36620cfb8f069854f3aa4e802367
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3d046494aff2c6afc49a616e6390f5f5 |
| publicationDate |
2016-10-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2016290934-A1 |
| titleOfInvention |
Optical Die to Database Inspection |
| abstract |
Methods and systems for detecting defects on a wafer are provided. One system includes one or more computer subsystems configured for generating a rendered image based on information for a design printed on the wafer. The rendered image is a simulation of an image generated by the optical inspection subsystem for the design printed on the wafer. The computer subsystem(s) are also configured for comparing the rendered image to an optical image of the wafer generated by the optical inspection subsystem. The design is printed on the wafer using a reticle. In addition, the computer subsystem(s) are configured for detecting defects on the wafer based on results of the comparing. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11686998-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9916965-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2017191948-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019173170-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11099137-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10209615-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10794839-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11119401-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2020018944-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9915625-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2021398853-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110637356-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109844918-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017220497-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2018217225-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10955742-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10012599-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11645744-B2 |
| priorityDate |
2015-04-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |