| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28556
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28568
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28562
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45525
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76877
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45527
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28506 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-285 |
| filingDate |
2016-01-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ce568abb788b325b03e5ea778947cbfb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8b36153852acaa11266176943b4182c9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c88433bc7ffcde6a03be06da8e8fabf9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c801c4bf49b643ad79c788ca0bdd5db6 |
| publicationDate |
2016-08-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2016233099-A1 |
| titleOfInvention |
Tungsten film forming method |
| abstract |
A tungsten film forming method for forming a tungsten film on a surface of a target substrate by an ALD (atomic layer deposition) method comprises adding a reduction gas to allow an ALD reaction to mainly occur when a tungsten chloride gas is supplied. In the ALD method, the tungsten chloride gas as a tungsten source gas and the reduction gas for reducing the tungsten chloride gas are alternately supplied into a chamber which accommodates the target substrate and is maintained under a depressurized atmosphere, with a purge process for purging an inside of the chamber performed between the supply of the tungsten chloride gas and the supply of the reduction gas. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11028479-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10400330-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10910225-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20190062207-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10734279-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2019164768-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10829854-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11295979-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2018237911-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10460987-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102219620-B1 |
| priorityDate |
2015-01-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |