| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a665d61597c2731ab4130971ee397dc9 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30625
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1409
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306 |
| filingDate |
2014-09-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8f3fbd6824067e90f9286f54a9d7a4a0 |
| publicationDate |
2016-07-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2016215170-A1 |
| titleOfInvention |
Polishing composition |
| abstract |
The present invention provides a polishing composition having excellent storage stability. The present invention relates to a polishing composition including abrasive grains and an oxidant containing a halogen atom, a value (A/B) obtained by dividing the total number (A) (unit: number) of silanol groups contained in the abrasive grains in the polishing composition by a concentration (B) (unit: % by mass) of the oxidant in the polishing composition being 8×10 23 or less. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2020017716-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11505718-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11111413-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2022002881-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-115380097-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11591495-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-108117839-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11732365-B2 |
| priorityDate |
2013-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |